Industries
Semiconductor & Electronics

Facility systems built for yield, not just equipment uptime.

Control systems, cleanroom SCADA, and MES-connected facility infrastructure for semiconductor fabs and electronics manufacturing. Environmental stability, utility reliability, and brownfield cutovers engineered around production risk.

Cleanroom Status · Live
ISO Class 5 watch
Bay 0312 pt/L+0.035 in. wc
Bay 0414 pt/L+0.031 in. wc
Litho 229 pt/L+0.022 in. wc
Etch 111 pt/L+0.034 in. wc
Sub-Fab18 pt/L+0.028 in. wc
The Problem

Three things that quietly damage fab performance.

01

Environmental drift shows up as yield loss

Particle counts, differential pressure, humidity, and temperature all move before scrap does. Most fabs and electronics plants still review excursions after the fact, across siloed systems, long after the lot or batch is already compromised.

02

Facility systems operate like separate projects

HVAC, UPW, exhaust, gas delivery, power, and process support systems often ship with their own controls and HMIs. Operators inherit six partial views instead of one operating picture, and nobody has a clean alarm, historian, or event model across the facility.

03

Upgrades carry production risk

Legacy PLCs, unsupported SCADA, and brownfield expansions have to be addressed without disturbing in-process wafers or cleanroom conditions. The technical work matters, but the cutover plan is what determines whether the project is safe to execute.

Solutions

Three systems we build for cleanroom operations.

MES Events
facility + tool context
14:21UPW stableTool Group A
14:18Lot hold preventedBay 04 drift
14:11Run state syncedCMP-12
14:05Dispatch updatedLitho Queue
13:57Exhaust alarm closedWet Bench 3
USE CASE / 03

MES & Tool Integration

Facility controls should not be isolated from the rest of the fab. We connect equipment state, facility events, environmental context, and process support data into MES and dispatch workflows so operations can see the full picture behind tool availability and process stability.

  • Equipment state, run/idle/down, and utility availability exposed to MES layers
  • SECS/GEM and custom interface support where facility and tool ecosystems intersect
  • Environmental and facility events linked to lot history and operating context
  • Integration patterns designed for brownfield fabs as well as new construction
MESSECS/GEMOPC UADispatch APIs
What it changes

Numbers from the cleanroom,
where facility stability protects yield.

Impact is usually measured in excursions caught earlier, utilities seen as one system, and facility work executed without disrupting in-process product.

1s
Sampling cadence to catch transient cleanroom excursions before yield shifts
1 view
Operating picture across HVAC, UPW, exhaust, gas, and utility systems
0
Unplanned facility cutovers that disrupt in-process product

Planning a facility upgrade, expansion, or cleanroom controls project?

Common questions

Straight answers.

Yes. The CHIPS and Science Act is driving billions in new U.S. semiconductor manufacturing investment, and we provide facility control systems, cleanroom environmental automation, UPW, chemical delivery, and MES integration for new fabs, expansions, and facility systems upgrades.

Our team includes engineers with backgrounds at Applied Materials — one of the world's largest semiconductor equipment companies. We understand the precision, the contamination requirements, and the operational culture of fab environments. We don't need to learn what a FOUP is or why differential pressure matters.

Yes. We design migrations with redundant PLC architectures — the new controller is installed, programmed, and tested in parallel with the existing system, and a coordinated cutover during a planned fab maintenance event transfers control with zero interruption to critical facility supply. Disruption to in-process wafers is not an option.

Yes. Equipment state tracking, run/idle/down status reporting, and facility event logging for integration with fab-wide MES platforms. SECS/GEM communication for process tool integration. Custom APIs for scheduling and dispatch system connectivity.

Network architecture includes proper segmentation between facility control networks, process tool networks, and corporate IT. Deterministic networking for time-critical control applications. Redundant architectures for critical facility systems. SEMI E187/E188 cybersecurity considerations are built into the fab network design from the start.

Safety instrumented systems for toxic and hazardous gas detection and response — silane, arsine, phosphine, chlorine, and other toxic and pyrophoric gases. Emergency shutdown logic for chemical delivery systems, gas cabinets, and exhaust systems. Integration with building management and fire alarm systems.

Ready to talk about your facility?

Whether it's a new fab buildout, a brownfield expansion, or a facility systems upgrade — tell us about the project.